Trace Analysis Services
Trace Analysis Service
Support for sample analysis scoping, outsourced test planning, and result interpretation for materials, chemicals, process liquids, and failure analysis.
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Ultra-trace Analytics provides ICP-MS method development and technology transfer services. Method design for complex matrices, calibration, SOP authoring, inter-lab transfer, and training to support standardization and reproducibility.
Material: N/A (Service)
Ultra-trace Analytics offers GC-MS analytical services for semiconductor organic solvents and high-cleanliness chemicals (IPA, OK73, nBAC, etc.), including trace organic contamination analysis, impurity identification, supplier material qualification, and process contamination investigations.
Material: N/A (Service)
Ultra-trace Analytics offers semiconductor-grade ICP-MS analytical services across high-purity chemicals, UPW, electronic-grade solvents, cleaning solutions, etch chemistries, and plating baths. Supports ppt – ppq class trace metal analysis, method development, and inter-lab transfer.
Material: N/A (Service)
Ultra-trace Analytics provides ultra-trace analytical services for liquid chemicals, including semiconductor chemicals, high-purity acids / alkalis, electronic-grade solvents, UPW, cleaning solutions, etch chemistries, plating baths, and process liquids. Methods such as GC-MS, ICP-MS, DMA-CPC, and IC are evaluated based on sample type and analytical objective for metal, organic, ionic, and particle contamination.
Material: —
Suitable for trace analysis, chemical sampling, storage, and pretreatment workflows while reducing background contamination risks.
View categoryWafer storage, transfer, and single-wafer handling solutions for high-cleanliness environments.
View categoryFixtures and consumables for high-cleanliness acid/alkali/solvent operation and daily lab workflows.
View categoryCustom PFA/PTFE labware development based on process, material compatibility, dimensions, and cleanliness requirements.
View categoryTrace analysis services cover semiconductor chemicals, UPW, electronic-grade solvents, cleaning solutions, etch chemistries, plating baths, and process liquids. Methods such as ICP-MS, GC-MS, DMA-CPC, and IC are used for metal, organic, ionic, and particle contamination analysis.
Method development, technology transfer, process contamination root-cause analysis, and supplier material qualification are also available.
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