Product items
Ultra-trace Analytics provides ultra-trace analytical services for liquid chemicals, including semiconductor chemicals, high-purity acids / alkalis, electronic-grade solvents, UPW, cleaning solutions, etch chemistries, plating baths, and process liquids. Methods such as GC-MS, ICP-MS, DMA-CPC, and IC are evaluated based on sample type and analytical objective for metal, organic, ionic, and particle contamination.
Share your use case, material, capacity, or size requirements for evaluation.
Ultra-trace Analytics provides ultra-trace analytical services for liquid chemicals, including semiconductor chemicals, high-purity acids / alkalis, electronic-grade solvents, UPW, cleaning solutions, etch chemistries, plating baths, and process liquids. Methods such as GC-MS, ICP-MS, DMA-CPC, and IC are evaluated based on sample type and analytical objective for metal, organic, ionic, and particle contamination.
Combining GC-MS, ICP-MS, DMA-CPC, and IC, we help trace the origin of micro-contamination in semiconductor chemicals. Ultra-trace Analytics evaluates the right technique for the matrix and analytical goal — across semiconductor chemicals, high-purity acids and bases, electronic-grade solvents, UPW, cleaning solutions, etchants, plating baths, and process liquids — and supports detection and interpretation of trace metals, organic contaminants, ionic contaminants, particle / nano-particle indicators, and other process-contamination signals.
Process defects, residues, abnormal background, turbidity changes, or batch-to-batch differences can stem from metals, organics, ions, particles, or interactions between several contamination sources. The right analytical technique depends on the question.
Semiconductor chemicals often need contamination signals tracked at ppb, ppt, or even lower levels. Blank control, container cleanliness, sample preparation, and the matrix all directly affect the credibility of the result.
Acids, bases, solvents, UPW, cleaning solutions, etchants, plating baths, and formulated liquids differ widely in matrix and can change instrument choice, sample-prep conditions, detection limits, and how a report should be read.
Supplier COAs usually cover a fixed list of specifications, but process anomalies can arise from off-spec contaminants, unknown organic peaks, ionic residues, particle shifts, or contamination introduced by containers and piping.
We evaluate GC-MS, ICP-MS / ICP-MS/MS, DMA-CPC, and IC against your sample and problem type — not limited to a single instrument.
Applicable to high-purity acids and bases, electronic-grade solvents, UPW, cleaning solutions, etchants, plating baths, process additives, and other semiconductor liquid chemicals.
On request we evaluate metal contamination, organic contamination, ionic contamination, particle / nano-particle indicators, and batch-to-batch differences.
We pay close attention to the effect of sample containers, blanks, reagents, sample preparation, operating environment, and method limitations on the result.
We can support good sample / bad sample, batch-to-batch, supplier-to-supplier, before/after-process, and reference-sample comparisons.
Depending on the scope, we can provide result interpretation, likely contamination pathways, method limitations, and follow-up analytical recommendations.
Not sure whether to use GC-MS, ICP-MS, DMA-CPC, or IC? Share your SDS, analytical goal, and target contaminants and we will help select the right technique combination.
| Service name | Liquid Chemical Ultra-trace Analysis |
|---|---|
| English name | Liquid Chemical Ultra-trace Analysis Service |
| Compatible techniques | GC-MS, ICP-MS / ICP-MS/MS, DMA-CPC, IC, etc. — confirmed against sample and analytical goal |
| Sample types | Semiconductor chemicals, high-purity acids and bases, electronic-grade solvents, UPW, cleaning solutions, etchants, plating baths, process liquids |
| Analytical directions | Metal elements, organic contaminants, ionic contaminants, particle / nano-particle indicators, batch differences, and process-anomaly signals |
| Industries served | Semiconductor, high-purity chemicals, electronic materials, chemical industry, high-cleanliness labs, materials R&D and QA |
| Service content | Sample-acceptance review, sample preparation, instrument analysis, data review, report delivery, and technical discussion |
| Information required | Please share sample name, SDS, main composition, target contaminants, analytical goal, sample quantity, safety information, and report requirements |
The actual analytical capability of this service depends on sample matrix, target contaminants, concentration range, sample preparation, blank control, instrument conditions, and method feasibility. For ppb, ppt, or lower-level analysis, please share target specifications and sample conditions for evaluation.
Different techniques vary significantly in applicability, detection capability, and reporting format. Please share SDS, main composition, target contaminants, expected concentration range, and analytical goal so we can confirm the right combination.
The service covers semiconductor chemicals and high-cleanliness liquids — high-purity acids and bases, electronic-grade solvents, UPW, cleaning solutions, etchants, plating baths, process additives, and other liquid samples. Actual feasibility depends on SDS, matrix, safety, and analytical goal.
We evaluate GC-MS, ICP-MS / ICP-MS/MS, DMA-CPC, and IC. GC-MS typically targets organic contamination, ICP-MS targets metals, IC targets ionic contamination, and DMA-CPC can evaluate particle / nano-particle indicators depending on the method.
Semiconductor processes are sensitive to metal, organic, ionic, and particle contamination. Even if main-component specs pass, trace contamination or batch differences can still affect process stability, defect rate, cleaning efficacy, or material qualification outcomes.
Depending on matrix, target contaminants, sample preparation, blank control, instrument conditions, and method feasibility, ppb, ppt, or lower levels can be evaluated for some items. Actual achievable level is confirmed against the sample and test results.
Share the sample background, the anomaly observed, where it occurs in the process, the SDS, and whether good sample / bad sample comparisons are available. Ultra-trace Analytics can then help evaluate a suitable technique combination.
GC-MS is mainly used for organic contamination and unknown-organic-peak analysis; ICP-MS for metals and elemental impurities; IC for ionic contamination; DMA-CPC can evaluate particle / nano-particle indicators depending on the method. The actual choice depends on the sample and question.
Yes — batch or supplier comparisons can be discussed based on the scope. We recommend submitting multiple batches, a reference sample, good sample / bad sample, or before/after samples so we can compare differences and anomaly signals.
Please share sample name, SDS, main composition, analytical goal, target contaminants, expected concentration range, sample quantity, safety information, whether comparison samples are available, and report requirements. If the sample is corrosive, volatile, flammable, toxic, or reactive, please flag this in advance.
Share your SDS, main composition, analytical goal, target contaminants, expected concentration range, and whether comparison samples are available. Ultra-trace Analytics can evaluate combinations of GC-MS, ICP-MS, DMA-CPC, and IC and propose an analysis plan and quotation that fit.
